Exclusive: China's CAS institute charts DUV route to 3nm…
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Exclusive: China's CAS institute charts DUV route to 3nm GAA without EUV
In the latest development, state-backed Chinese Academy of Sciences (CAS) has established a preliminary gate-all-around (GAA) device development path using the less advanced deep ultraviolet (DUV) lithography, Taiwanese media Digitimes reported on Thursday, citing a speech by Ye Tianchun, a veteran from the academy’s Institute of Microelectronics (IMECAS).
#technology #hardware
In the latest development, state-backed Chinese Academy of Sciences (CAS) has established a preliminary gate-all-around (GAA) device development path using the less advanced deep ultraviolet (DUV) lithography, Taiwanese media Digitimes reported on Thursday, citing a speech by Ye Tianchun, a veteran from the academy’s Institute of Microelectronics (IMECAS).
#technology #hardware
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